Mo/Si多层膜是13.5 nm极紫外波段理想的反射镜膜系，它与极紫外光源的结合使得极紫外光刻成为了目前最先进的制造手段之一。极紫外光源的实际应用对Mo/Si多层膜提出了高反射率、高热稳定性、抗辐照损伤、大口径等诸多要求。针对极紫外光源用Mo/Si多层膜面临的膜厚梯度控制和高温环境问题，利用掩模板辅助法对大口径曲面基底上不同位置处的多层膜膜厚进行修正；选择C作为扩散阻隔层材料，对磁控溅射法制备的Mo/Si、Mo/Si/C和Mo/C/Si/C三种多层膜在300 ℃高温应用环境下的热稳定性展开了研究。研究结果表明：通过掩模板辅助的方式能够将300 mm口径曲面基底上不同位置处的Mo/Si多层膜膜厚控制在预期厚度的±0.45%以内，基底上不同位置处Mo/Si多层膜的膜层结构和表面粗糙度基本相同；引入C扩散阻隔层后，经过300 ℃退火，Mo/Si多层膜的反射率损失从9.0%减少为1.8%，说明C的引入能够有效减少高温对多层膜微结构的破坏和对光学性能的影响，提高了多层膜的热稳定性。

离子轰击固体表面诱导的纳米结构具有小周期（10~100 nm）、大面积、准周期的特点。利用氩离子轰击在减反膜上制备出横向特征尺寸在100 nm附近、横向周期性与纵向连续性逐步明显的准周期纳米波纹结构。为了增大表征面积，利用极紫外散射法表征了上述自组织纳米波纹的形貌特征。结果显示，面内和锥角模式的极紫外散射法所获得的样品横向和纵向形貌特征，均能够与原子力扫描显微镜所获得的样品形貌特征相对应，这初步说明了此方法表征准周期纳米波纹结构基本形貌特征的可行性，为后续的定量分析提供基础。同时，利用极紫外同步辐射光表征的自组织纳米结构面积达到了mm²量级，将合肥光源计量光束线的表征范围拓展到自组织纳米结构，这也为未来探索极紫外光刻掩模的散射表征等研究提供参考。

基于多层膜准单色覆盖50~1500 eV能谱的多能点发射光谱测量系统可获得“聚龙一号”装置Z-pinch等离子体X射线源的能谱结构和总能量等信息。考虑装置的条件,在13 nm处的多层膜需要工作在掠入射角60°。常规的Mo/Si多层膜尽管反射率最高,但其带宽较大,不能满足多层膜准单色的要求。因此提出将Mo和C共同作为多层膜的吸收层材料与Si组成Si/Mo/C多层膜,可使反射率降低较小而带宽明显减小。采用磁控溅射方法制备了Si/Mo/C多层膜,其掠入射X射线反射测量表面多层膜的结构清晰完整,同步辐射工作条件下反射率测量, 得到Si/Mo/C多层膜在13 nm处和掠入射角60°时的反射率为56.5%, 带宽为0.49 nm(3.7 eV)。

We report on the optical performance, structure and thermal stability of periodic multilayer films containing Zr and Al(1wt.-%Si) or Al(pure) layers designed for the use as extreme ultraviolet (EUV) high reflective mirrors in the range of 17–19 nm. The comparison of Al/Zr (Al(1wt.-%Si)/Zr and Al(pure)/Zr) multilayers fabricated by direct–current magnetron sputtering shows that the optical and structural performances of two systems have much difference because of Si doped in Al. From the results of grazing incidence X-ray reflection (GIXR), X-ray diffraction (XRD), and EUV, the Si can disfavor the crystallization of Al and smooth the interface, consequently increase the reflectance of EUV in the Al(1wt.-%Si)/Zr systems. For the thermal stability of two systems, the first significant structural changes appear at 250 oC. The interlayers are transformed from symmetrical to asymmetrical, where the Zr-on-Al interlayers are thicker than Al-on-Zr interlayers. At 295 oC for Al(pure)/Zr and 298 oC for Al(1wt.-%Si)/Zr, the interfaces consist of amorphous Al-Zr alloy transform to polycrystalline Al-Zr alloy which can decrease the surface roughness and smooth the interfaces. Above 300 oC, the interdiffusion becomes larger, which can enlarge the differences between Zr-on-Al and Al-on-Zr interlayers. Based on the analyses, the Si doped in Al cannot only influence the optical and structural performances of Al/Zr systems, but also impact the reaction temperatures in the annealing process.

为研制极紫外波段窄带多层膜反射镜，采用低原子序数材料组合设计了30.4 nm波长处Mg/SiC，Si/SiC，Si/B4C和Si/C多层膜反射镜，并与极紫外波段传统的Mo/Si多层膜反射镜进行对比。采用直流磁控溅射技术制备了这些多层膜，在国家同步辐射实验室辐射与计量光束线完成了多层膜反射率测量，测量结果表明：Mg/SiC多层膜的带宽最小，为1.44 nm，且反射率最高，为44%；而Mo/Si多层膜的反射率仅为24%，带宽为3.11 nm。实验结果证明了采用低原子序数材料组成的多层膜的带宽要比常规多层膜窄，该方法可以应用于极紫外波段高分辨研究。

Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5–28.5 nm at incidence angle of 5? is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5–28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.

We propose a general correction method for the efficiency measurement of optical components in the 45–110 nm range to eliminate the contamination of higher-order harmonics at beamline U27 of the Hefei Light Source (HLS). The influence of harmonics can be deducted effectively from the initial measurement results through the analysis of the proportion of harmonics with a transmission grating and the efficiency measurement of optical elements at the harmonics wavelengths. The reflectivity measurement of a gold film is performed at the beamline to verify its validity. Results indicate that the corrected reflectivity is in good agreement with the theoretical value. The maximal deviation amounts to 1.93% at a wavelength of 85 nm and an incident angle of 5?.

利用自行设计的实验装置,研究了同步辐射光活化氧对光学元件表面碳污染的清洗作用。清洗前样品的碳层厚度为10.3 nm,同步辐射光被引入实验用真空室内,真空室内干燥氧气的压强维持在1.0 Pa,研究显示同步辐射活化氧能有效地清除硅片表面的石墨型碳层。通过测试清洗前后碳膜的反射率和使用IMD软件对清洗后硅片反射率的拟合,可得碳层的去除率为1.75 nm/h。

We fabricate and measure a multilayer-coated ion-beam-etched laminar grating for the extreme ultraviolet wavelength region. The fabrication process is carefully controlled so that the grating groove and multilayer-coating parameters well meet the design targets. At an incident angle of 10\degree, the peak diffraction efficiency of the +1st order is 20.6% at 14.56 nm and that of the -1st order is 22.1% at 14.65 nm, both close to the theoretical limits.